Freiburg, Germany

Joachim John

This inventor holds 4 USPTO granted patents and 3 EPO patents. Top assignees: Imec Vzw, Katholieke Universiteit Leuven, Excico Group Nv. Active years: 2011-2016.


% Patents Active = 25.0

 

Average Co-Inventor Count = 2.5

ph-index = 1

Forward Citations = 5(Granted Patents)


Location History:

  • Leuven, BE (2015)
  • Freiburg, DE (2011 - 2016)

Company Filing History:


Years Active: 2011-2016

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4 patents (USPTO):Explore Patents

Title: Joachim John: Innovator in Semiconductor Technology

Introduction

Joachim John is a prominent inventor based in Freiburg, Germany, known for his contributions to semiconductor technology. With a total of 4 patents, he has made significant advancements in methods related to metal silicide layers and single side texturing of semiconductor substrates.

Latest Patents

One of Joachim John's latest patents is a method for forming metal silicide layers. This invention involves a process for applying a metal layer on a textured silicon substrate and utilizing pulsed laser annealing with specific parameters. The method aims to convert part of the metal layer into a metal silicide layer, which is crucial for enhancing the efficiency of photovoltaic cells. Another notable patent is a method for single side texturing of crystalline semiconductor substrates. This technique includes providing a substrate with a masking layer and etching the substrate in a polishing solution to achieve the desired texture.

Career Highlights

Throughout his career, Joachim John has worked with esteemed organizations such as Imec and Katholieke Universiteit Leuven, also known as KU Leuven R&D. His work in these institutions has allowed him to collaborate on various innovative projects that push the boundaries of semiconductor technology.

Collaborations

Joachim has collaborated with notable colleagues, including Anne Lorenz and Joff Derluyn. Their combined expertise has contributed to the successful development of advanced semiconductor methods.

Conclusion

Joachim John's innovative work in semiconductor technology, particularly in the areas of metal silicide layers and substrate texturing, showcases his significant impact on the field. His patents reflect a commitment to advancing technology and improving the efficiency of photovoltaic cells.

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