The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 03, 2015
Filed:
Feb. 11, 2011
Applicants:
Victor Prajapati, Providence, RI (US);
Joachim John, Leuven, BE;
Inventors:
Victor Prajapati, Providence, RI (US);
Joachim John, Leuven, BE;
Assignees:
IMEC, , BE;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/302 (2006.01); H01L 21/461 (2006.01); B44C 1/22 (2006.01); C03C 15/00 (2006.01); C03C 25/68 (2006.01); H01L 31/0236 (2006.01);
U.S. Cl.
CPC ...
H01L 31/0236 (2013.01); Y02E 10/50 (2013.01);
Abstract
A method for single side texturing of a crystalline semiconductor substrate () comprises: providing a substrate (), for example a semiconductor substrate, comprising a first surface () and a second surface () opposite to one another with respect to the substrate (); providing a masking layer () with a random pattern on the first surface () of the substrate (); and etching the substrate () in a polishing solution, thereby texturing the first surface () of the substrate () and polishing the second surface () in a single wet etching step.