Jiun Y Wu

Title: Innovations by Jiun Y Wu

Introduction

Jiun Y Wu is a prominent inventor based in Dou-Lio, Taiwan. He has made significant contributions to the field of semiconductor technology, holding a total of 8 patents. His work focuses on improving the performance and reliability of semiconductor devices.

Latest Patents

One of his latest patents is titled "Metallization to improve electromigration resistance." This innovative method involves a new design of metal contact shapes and profiles that significantly reduce current density and enhance the electromigration resistance of metal lines. By forming metal contacts in a rectangular shape, with the wider side perpendicular to the current direction, and utilizing concavo-concave profiles for contact openings, Jiun Y Wu has created a solution that provides a wider conducting cross-sectional area compared to conventional designs. Additionally, gaps within wide and high current metal lines help to lower current density uniformly across the metal line.

Another notable patent is the "Method of making a reliable barrier layer." This method describes the formation of a metal diffusion barrier layer in semiconductor device structures. The process involves depositing a thin layer of titanium over the dielectric layer and within contact openings, followed by annealing in a nitrogen atmosphere. The subsequent steps include forming stable titanium compounds and low resistance silicide on the contact silicon, ultimately resulting in a barrier layer with excellent adhesion to the dielectric layer, which enhances pad bonding yield.

Career Highlights

Jiun Y Wu is currently employed at United Microelectronics Corporation, where he continues to innovate in semiconductor technology. His work has been instrumental in advancing the reliability and efficiency of semiconductor devices.

Collaborations

Some of his notable coworkers include Water Lur and Anna Su, who contribute to the collaborative environment at United Microelectronics Corporation.

Conclusion

Jiun Y Wu's contributions to semiconductor technology through his innovative patents demonstrate his commitment to enhancing device performance and reliability. His work continues to impact the industry positively.