Company Filing History:
Years Active: 2022-2025
Title: Innovations by Jiun-Ruey Chen in Integrated Circuit Design
Introduction
Jiun-Ruey Chen, an accomplished inventor based in Hillsboro, Oregon, is making significant strides in the field of integrated circuit design. With a total of two patents to her name, she has contributed noteworthy advancements in the technology sector, particularly focusing on interconnect structures for integrated circuits.
Latest Patents
Her latest patents revolve around "Subtractively patterned interconnect structures for integrated circuits." These innovations involve intricate designs where feature ends are specifically defined through multiple patterning of various cap materials, which play a crucial role in reducing misregistration. The subtractively patterned features could include lines integrated with damascene vias, as well as vias integrated with damascene lines. Notably, these structures are designed to be part of a planar metal layer and defined concurrently with interconnect lines. Chen's work also incorporates air gap isolation structures and considers barrier materials, such as graphene or metal chalcogenides, which may be utilized in different aspects of her patterned features.
Career Highlights
Jiun-Ruey Chen works at Intel Corporation, a leading company in the technology and semiconductor industry. Her efforts in creating innovative interconnect structures not only enhance the performance and efficiency of integrated circuits but also pave the way for future advancements in semiconductor technology.
Collaborations
Throughout her career, Chen has collaborated with esteemed colleagues such as Noriyuki Sato and James M. Blackwell. These partnerships highlight her ability to work within teams to tackle complex challenges in integrated circuit development and further enhance her contributions to the field.
Conclusion
Jiun-Ruey Chen’s inventions and patents represent crucial developments in integrated circuit technology. Her work continues to influence the industry significantly, demonstrating the vital role of innovation and collaboration in driving technological progress. As she continues her journey at Intel Corporation, the future holds promising advancements driven by her expertise and creativity.