Mountain View, CA, United States of America

Jisu Jiang

This inventor holds 1 USPTO granted patent. Top assignee: Intel Corporation. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Jisu Jiang. Retrieved from https://idiyas.com/inventor/jisu-jiang-6hyd7eo2

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


Average Co-Inventor Count = 1.0


Company Filing History:


Years Active: 2026

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1 patent (USPTO):Explore Patents

Title: Jisu Jiang: Innovator in Semiconductor Manufacturing

Introduction

Jisu Jiang is a notable inventor based in Mountain View, CA. He has made significant contributions to the field of semiconductor manufacturing. His innovative work focuses on improving the encapsulation process in semiconductor devices.

Latest Patents

Jisu Jiang holds a patent for a dam surrounding a die on a substrate. This invention relates to apparatuses, processes, and techniques for a dam structure that encircles a die coupled with a substrate. The dam is designed to decrease the risk of die shift during the flow of encapsulation material. By creating a cavity, the dam moderates different flow rates of material, preventing varying pressures from causing the die to shift its position. This innovation enhances the reliability of semiconductor manufacturing processes.

Career Highlights

Jisu Jiang is currently employed at Intel Corporation, where he continues to develop cutting-edge technologies. His work has been instrumental in advancing the efficiency and effectiveness of semiconductor manufacturing techniques. With a focus on practical solutions, Jiang's contributions are vital to the industry.

Collaborations

Jisu Jiang collaborates with talented colleagues, including Liang He and Jung Kyu Han. Their combined expertise fosters an environment of innovation and creativity, leading to groundbreaking advancements in semiconductor technology.

Conclusion

Jisu Jiang's contributions to semiconductor manufacturing through his innovative patent demonstrate his commitment to enhancing industry standards. His work not only improves manufacturing processes but also sets a foundation for future advancements in the field.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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