Jiro Naka

Title: Jiro Naka: Innovator in Polymer and Silicon Wafer Analysis

Introduction

Jiro Naka is a prominent inventor based in Tokyo, Japan. He has made significant contributions to the fields of polymer analysis and silicon wafer technology. With a total of 2 patents, Naka's work has advanced the methods used in material analysis.

Latest Patents

Naka's latest patents include a "Method of determining minute amounts of additives in polymers." This innovative method allows for the rapid analysis of minute quantities of materials included in different substances. The process involves a short extraction treatment that does not require extensive time. The method consists of mounting a sample piece on a sample table, applying a solvent to extract the minute content, and analyzing the extracted material.

Another notable patent is the "Apparatus for recovering impurities from a silicon wafer." This method focuses on recovering impurities from the surface of silicon wafers. It includes a pretreatment step to decompose oxide and nitride films, followed by a recovery step for impurities on the wafer's surface, excluding the peripheral portion.

Career Highlights

Jiro Naka is associated with Mitsubishi Electric Corporation, where he applies his expertise in material analysis. His work has been instrumental in enhancing the efficiency and accuracy of material testing processes.

Collaborations

Naka collaborates with talented coworkers, including Noriko Hirano and Junji Kobayashi. Their combined efforts contribute to the innovative projects at Mitsubishi Electric Corporation.

Conclusion

Jiro Naka's contributions to the fields of polymer and silicon wafer analysis demonstrate his commitment to innovation. His patents reflect a deep understanding of material science and a dedication to improving analytical methods.