Company Filing History:
3 out of 5,989 
1 out of 164,197 
1 out of 400 
Years Active: 1997-2001
Title: The Innovative Mind of Jiong Chen
Introduction
Jiong Chen, an accomplished inventor based in Beverly, Massachusetts, has made significant contributions to the field of ion implantation technology. With a total of five patents to his name, Chen continues to push the boundaries of innovation in his domain.
Latest Patents
Among his latest inventions are two notable patents that have the potential to revolutionize the efficiency of ion sources. The first is a method for operating GEF4 gas in hot cathode discharge ion sources. This invention introduces a nitrogen-containing co-bleed gas into an ion implantation apparatus, extending the operating lifetime of the hot cathode discharge ion source while enhancing its functionality. The second patent involves the design of a toroidal filament for plasma generation. This innovative filament features a thermally emissive central portion coiled to form a closed loop, significantly improving the magnetic confinement of electrons and increasing the effectiveness of ion sources in implanting processes.
Career Highlights
Jiong Chen has held influential positions at several prestigious companies during his career. Notably, he has worked for Eaton Corporation, where he leveraged his expertise in technology development, and for IBM, one of the leading technology firms globally, where he contributed to cutting-edge projects in his field.
Collaborations
Throughout his journey as an inventor, Chen has collaborated with talented individuals, including Victor M Benveniste and Peter Lawrence Kellerman. Together, they have shared insights and ideas that have further advanced the evolution of ion implantation technologies, combining their unique expertise to foster innovation.
Conclusion
Jiong Chen's innovative work in the field of ion implantation is a testament to his dedication and skill as an inventor. Through his latest patents and collaborations, Chen continues to drive advancements that have the potential to impact the industry significantly. His contributions are anticipated to inspire future innovations within the technological landscape.