The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 10, 2001
Filed:
Sep. 16, 1998
Applicant:
Inventors:
Jiong Chen, Beverly, MA (US);
Brian S. Freer, Medford, MA (US);
John F. Grant, Beverly, MA (US);
Lawrence T. Jacobs, Jericho, VT (US);
Joseph L. Malenfant, Jr., Colchester, VT (US);
Assignee:
International Business Machines Corporation, Armonk, NY (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 2/700 ; H01J 3/730 ;
U.S. Cl.
CPC ...
H01J 2/700 ; H01J 3/730 ;
Abstract
The present invention provides a method of extending, i.e. prolonging, the operating lifetime of hot cathode discharge ion source by utilizing and introducing a nitrogen-containing co-bleed gas into an ion implantation apparatus which contains at least a hot cathode discharge ion source and an ion implantation gas such as GeF,.