Jericho, VT, United States of America

Lawrence T Jacobs


Average Co-Inventor Count = 5.0

ph-index = 1

Forward Citations = 14(Granted Patents)


Company Filing History:


Years Active: 2001

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1 patent (USPTO):Explore Patents

Title: The Innovations of Lawrence T Jacobs

Introduction

Lawrence T Jacobs is a notable inventor based in Jericho, Vermont. He has made significant contributions to the field of ion implantation technology. His work focuses on enhancing the performance and longevity of ion sources used in various applications.

Latest Patents

One of Jacobs' key patents is titled "Method to operate GEF4 gas in hot cathode discharge ion sources." This invention provides a method for extending the operating lifetime of hot cathode discharge ion sources. It involves utilizing a nitrogen-containing co-bleed gas in an ion implantation apparatus, which includes a hot cathode discharge ion source and an ion implantation gas such as GeF.

Career Highlights

Jacobs is associated with International Business Machines Corporation, commonly known as IBM. His work at IBM has allowed him to explore innovative solutions in the field of ion implantation. He holds 1 patent that showcases his expertise and dedication to advancing technology.

Collaborations

Throughout his career, Jacobs has collaborated with talented individuals such as Jiong Chen and Brian S Freer. These collaborations have contributed to the development of innovative technologies and solutions in the industry.

Conclusion

Lawrence T Jacobs is a distinguished inventor whose work has made a significant impact in the field of ion implantation technology. His innovative methods and collaborations continue to influence advancements in this area.

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