Jinhua Min

Title: Jinhua Min: Innovator in Projection Objective Measurement

Introduction

Jinhua Min is a notable inventor based in Shanghai, China. He has made significant contributions to the field of optical engineering, particularly in the measurement of projection objectives. His innovative approach has led to the development of a unique method that enhances the precision of optical measurements.

Latest Patents

Jinhua Min holds a patent for a "Method for measuring distortion of projection objective." This method involves obtaining positional deviations from patterns formed during exposure processes. It includes steps such as subtracting motional errors and calculating distortion through a fitting process. This patent showcases his expertise in improving measurement techniques in optical systems.

Career Highlights

Jinhua Min is currently employed at Shanghai Micro Electronics Equipment Co., Ltd. His work at this company has allowed him to apply his innovative ideas in a practical setting, contributing to advancements in microelectronics and optical technologies.

Collaborations

Throughout his career, Jinhua Min has collaborated with talented individuals such as Li Fang and Gang Sun. These collaborations have fostered a creative environment that encourages the exchange of ideas and enhances the development of new technologies.

Conclusion

Jinhua Min's contributions to the field of optical engineering, particularly through his patented method for measuring distortion, highlight his role as an innovator. His work continues to influence advancements in the industry, showcasing the importance of precision in optical measurements.