Shanghai Micro Electronics Equipment Co., Ltd.

Jinhua Min

Jun Zhang

Li Fang

Gang Sun

A method for measuring distortion of a projection objective, which includes: obtaining a plurality of first positional deviations between two groups of patterns formed respectively after two exposures performed in a same exposure field during a stepping and exposing process of the reticle stage (S); obtaining a plurality of second positional deviations between two groups of patterns formed respectively after another two exposures performed in a same exposure field during a stepping and exposing process of the workpiece stage (S); subtracting motional errors of the reticle stage and/or workpiece stage from each of the plurality of first and second positional deviations to obtain corresponding first and second corrected deviations (S, S); calculating differences each between a pair of corrected deviations (S); and calculating the distortion of the projection objective by a fitting process (S).

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Shanghai, China

Jinhua Min