Jingsong Wang

Title: Jingsong Wang: Innovator in Lithographic Technology

Introduction

Jingsong Wang is a prominent inventor based in Beijing, China. He has made significant contributions to the field of lithographic technology, holding a total of 3 patents. His innovative work focuses on enhancing the efficiency and functionality of lithographic devices.

Latest Patents

Wang's latest patents include a "Dual wafer stage exchanging system for lithographic device." This system features two wafer stages that operate between an exposure workstation and a pre-processing workstation. The stages are mounted on a base and are suspended above it using air bearings. Each stage is guided by a Y-direction guide rail, which connects to a main driving unit and can be coupled with auxiliary driving units. This design allows for efficient movement and position exchange of the wafer stages.

Another notable patent is the "Dual-stage exchange system for lithographic apparatus." This system consists of two silicon chip stages that operate on the same base stage and are also suspended by air bearings. The stages can move along guide rails in the Y direction, with driving units facilitating movement in the X direction. The innovative design allows for precise position exchange between the two silicon chip stages.

Career Highlights

Jingsong Wang is affiliated with Tsinghua University, where he continues to advance research in lithographic technology. His work has garnered attention for its practical applications in the semiconductor industry.

Collaborations

Wang has collaborated with notable colleagues, including Yu Zhu and Ming Lei Zhang. Their combined expertise has contributed to the development of cutting-edge technologies in their field.

Conclusion

Jingsong Wang's contributions to lithographic technology exemplify the spirit of innovation. His patents reflect a commitment to improving the efficiency of lithographic devices, making a lasting impact on the industry.