Singapore, Singapore

Jingsheng Shi

USPTO Granted Patents = 2 

Average Co-Inventor Count = 4.0

ph-index = 1


Company Filing History:


Years Active: 2024-2025

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2 patents (USPTO):Explore Patents

Title: Jingsheng Shi: Innovator in Optical Metrology

Introduction

Jingsheng Shi is a prominent inventor based in Singapore, known for his contributions to the field of optical metrology. With a focus on enhancing measurement techniques, he has developed innovative solutions that address challenges in the industry. His work has led to the filing of 2 patents, showcasing his commitment to advancing technology.

Latest Patents

One of Jingsheng Shi's latest patents is titled "Mitigation of Undesired Spectral Effects in Optical Metrology." This invention involves an optical measurement process that extracts relevant spectral variations from a sample, allowing for the removal of irrelevant spectral signals. By utilizing a physics-based model and machine learning, this method enhances the accuracy of measurements in complex environments.

Another significant patent is "Measurements of Structures in Presence of Signal Contaminations." This invention addresses the contamination of metrology data by non-target signals. By employing local gradient-based mixed modeling and machine learning, Jingsheng's approach effectively reduces or eliminates unwanted signals, ensuring precise target metrology data.

Career Highlights

Jingsheng Shi is currently employed at Onto Innovation Inc., where he continues to push the boundaries of optical measurement technologies. His expertise in the field has made him a valuable asset to the company, contributing to its innovative projects and research initiatives.

Collaborations

Throughout his career, Jingsheng has collaborated with notable colleagues, including Jie Li and Petar Žuvela. These partnerships have fostered a collaborative environment that encourages the exchange of ideas and advancements in optical metrology.

Conclusion

Jingsheng Shi's work in optical metrology exemplifies the spirit of innovation and dedication to improving measurement techniques. His patents reflect a deep understanding of the challenges in the field and a commitment to finding effective solutions. Through his contributions, he continues to make a significant impact in the realm of optical measurements.

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