The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 17, 2024
Filed:
Oct. 26, 2023
Onto Innovation Inc., Wilmington, MA (US);
Jingsheng Shi, Singapore, SG;
Yiliang Liu, Singapore, SG;
Jie Li, San Jose, CA (US);
Pedro Vagos, Chennevieres, FR;
Onto Innovation Inc., Wilmington, MA (US);
Abstract
Contamination of metrology data by non-target signals caused by the measurement spot being incident on target and non-target areas may be reduced or eliminated using local gradient based mixed modeling or a machine learning model. The local gradient based mixed modeling approach uses a mixed model based on a model of the target region and a term of the local gradient of measured signals, which may be determined from scan data. The machine learning approach obtains mixed metrology data from a plurality of locations with respect to the target. The mixed metrology data is a mixture of target signals from the target and non-target signals from a non-target area and is used by a trained machine learning model to determine target metrology data that includes target signals from the target without the non-target signals and is used to determine parameters of interest for the target.