Yiliang Liu

Title: Yiliang Liu: Innovator in Metrology Data Solutions

Introduction

Yiliang Liu is a prominent inventor based in Singapore, known for his innovative contributions to the field of metrology. With a focus on improving measurement accuracy in the presence of signal contaminations, Liu has made significant strides in developing advanced methodologies.

Latest Patents

Liu holds a patent titled "Measurements of structures in presence of signal contaminations." This invention addresses the contamination of metrology data by non-target signals, which can occur when the measurement spot interacts with both target and non-target areas. His approach utilizes local gradient-based mixed modeling and machine learning techniques to reduce or eliminate these contaminations. The local gradient-based mixed modeling employs a mixed model that incorporates a model of the target region along with the local gradient of measured signals derived from scan data. Meanwhile, the machine learning model processes mixed metrology data from various locations to extract accurate target signals, thereby enhancing the reliability of the measurements.

Career Highlights

Liu's career is marked by his dedication to advancing metrology techniques. His work has not only contributed to the academic community but has also had practical applications in various industries. His innovative solutions have garnered attention and recognition within the field.

Collaborations

Liu collaborates with esteemed colleagues, including Jingsheng Shi and Jie Li, who share his commitment to pushing the boundaries of metrology and signal processing.

Conclusion

Yiliang Liu's contributions to the field of metrology through his innovative patent demonstrate his expertise and commitment to enhancing measurement accuracy. His work continues to influence the industry and pave the way for future advancements.