Jing S Shu

Jing S Shu is an accomplished inventor based in Plano, TX (US). She has made significant contributions to the field of microlithic measurement and resist compositions, holding a total of 3 patents. Her work is particularly relevant in the context of advanced electronic measurement techniques.

Latest Patents

One of her latest patents is an antistatic solution for microlithic measurement. This solution aids in the measurement of patterned resists by scanning electronic microscopes. It comprises a quaternary ammonium salt and a suitable solvent, with the anion of the salt selected from a group that includes saccharinate, nitrate, sulfates, alkyl sulfates, and alkoxylate. The cation groups are chosen from alkyl and alkyl derivatives. Another notable patent is for plasma developable negative resist compositions for electron beam and X-ray applications. This composition includes a polymeric matrix material, a polymerizable monomer, and an onium salt radiation-sensitive initiator. The monomer is polymerized by irradiating the resist with an e-beam, X-ray, or ultraviolet source, followed by heating the exposed resist. The resist is then developed using a dry etchant such as plasma or a reactive ion etchant.

Career Highlights

Jing S Shu is currently employed at Texas Instruments Corporation, where she continues to innovate and contribute to the field of electronic measurement and materials science. Her expertise and inventions have positioned her as a key figure in her area of specialization.

Collaborations

Some of her notable coworkers include Wei William Lee and Gilbert L Varnell. Their collaborative efforts have likely contributed to the advancements in technology and innovation within their projects.

Conclusion

Jing S Shu's work exemplifies the spirit of innovation in the field of electronic measurement and resist technology. Her patents reflect her commitment to advancing the industry and her role as a leading inventor.