Jincheng Pei

Title: Jincheng Pei: Innovator in Metrology Technology

Introduction

Jincheng Pei is a prominent inventor based in Shanghai, China. He has made significant contributions to the field of metrology, particularly in the development of advanced measurement systems. With a total of 2 patents, Pei's work is recognized for its innovative approach to enhancing measurement accuracy in lithography processes.

Latest Patents

Pei's latest patents include a "Thick Photo Resist Layer Metrology Target." This invention features a metrology target that comprises a first target structure and a second target structure, each containing multiple cells with specific pattern elements. This design aims to improve the precision of measurements in photolithography. Another notable patent is the "System and Method for Tilt Calculation Based on Overlay Metrology Measurements." This system utilizes a controller connected to metrology tools to receive overlay measurements, determine tilt, and adjust for inaccuracies in lithography tools. These innovations are crucial for enhancing the reliability of metrology in semiconductor manufacturing.

Career Highlights

Jincheng Pei is currently employed at Kla Corporation, a leading company in the field of metrology and inspection solutions. His work at Kla Corporation has positioned him as a key player in advancing measurement technologies that are essential for the semiconductor industry.

Collaborations

Pei has collaborated with notable colleagues, including Lingyi Guo and Roie Volkovich. These partnerships have fostered a collaborative environment that encourages innovation and the sharing of ideas in the field of metrology.

Conclusion

Jincheng Pei's contributions to metrology technology through his patents and work at Kla Corporation highlight his role as an influential inventor. His innovative solutions are paving the way for advancements in measurement accuracy, which are vital for the semiconductor industry.