The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 16, 2024
Filed:
Aug. 18, 2020
Applicant:
Kla Corporation;
Inventors:
Lingyi Guo, Shanghai, CN;
Jincheng Pei, Shanghai, CN;
Assignee:
KLA Corporation, Milpitas, CA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01B 11/27 (2006.01); G03F 1/70 (2012.01); G03F 1/36 (2012.01); G03F 7/00 (2006.01);
U.S. Cl.
CPC ...
G01B 11/272 (2013.01); G03F 1/36 (2013.01); G03F 1/70 (2013.01); G03F 7/70633 (2013.01);
Abstract
A metrology target includes a first target structure formed within at least one of a first area and a third area of a first layer of a sample, where the first target structure comprises a plurality of first cells containing one or more first cell pattern elements; and a second target structure formed within at least one of a second area and a fourth area of a second layer of the sample, the second target structure comprising a plurality of second cells containing one or more second cell pattern elements.