Osan, South Korea

Jin Suk Park

This inventor holds 1 USPTO granted patent. Top assignee: Auros Technology, Inc.. Active years: 2025.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Jin Suk Park. Retrieved from https://idiyas.com/inventor/jin-suk-park-dkyyofrc

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 3.0

ph-index = 1


Company Filing History:


Years Active: 2025

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1 patent (USPTO):Explore Patents

Title: Jin Suk Park: Innovator in Image Acquisition Technology

Introduction

Jin Suk Park is a notable inventor based in Osan, South Korea. He has made significant contributions to the field of image acquisition technology. His innovative approach has led to the development of a unique patent that enhances the efficiency of image capturing processes.

Latest Patents

Jin Suk Park holds a patent for an "Image acquisition method and device." This invention involves a sophisticated process of acquiring optical signals through the use of penetrative and reflective light beams. The method allows for the determination of whether a measurement target mark is covered by a mask layer, facilitating the acquisition of accurate mark images under varying conditions.

Career Highlights

Currently, Jin Suk Park is employed at Auros Technology, Inc., where he continues to push the boundaries of technology in his field. His work has been instrumental in advancing the capabilities of image acquisition systems, making them more reliable and effective.

Collaborations

Throughout his career, Jin Suk Park has collaborated with talented individuals such as So Young Hwang and Seung Soo Lee. These partnerships have fostered a creative environment that encourages innovation and the sharing of ideas.

Conclusion

Jin Suk Park's contributions to image acquisition technology exemplify the spirit of innovation. His patent and ongoing work at Auros Technology, Inc. highlight his commitment to advancing this critical field.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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