Company Filing History:
Years Active: 2010-2013
Title: Jin-sik Jung: Innovator in Photomask Technology
Introduction
Jin-sik Jung is a prominent inventor based in Seoul, South Korea. He has made significant contributions to the field of semiconductor technology, particularly in photomask innovations. With a total of 4 patents to his name, Jung continues to push the boundaries of technology.
Latest Patents
One of his latest patents is a "System for monitoring haze of a photomask." This system includes an installation unit where a photomask is mounted, a light emission unit that emits a light beam to the photomask, a detection unit that detects the diffraction pattern of the light beam, and an analysis unit that analyzes the detected diffraction pattern. Another notable patent is for a "Photomask including ion trapping layer and method of manufacturing semiconductor device using the photomask." This photomask features an ion trapping layer designed to trap ions near the transparent substrate, enhancing the manufacturing process of semiconductor devices.
Career Highlights
Jin-sik Jung is currently employed at Samsung Electronics Co., Ltd., where he applies his expertise in semiconductor technology. His work has been instrumental in advancing the capabilities of photomasks used in the semiconductor industry.
Collaborations
Jung collaborates with talented individuals such as Hee-bom Kim and Sung-min Huh, contributing to innovative projects within his field.
Conclusion
Jin-sik Jung is a key figure in the development of photomask technology, with several patents that showcase his innovative spirit. His contributions continue to impact the semiconductor industry positively.