Jin Ryeong Park

Jin Ryeong Park is a notable inventor based in Hwaseong, South Korea. He has made significant contributions to the field of overlay measurement technology, particularly in optimizing focus for wafers with multi-peak focus. His innovative approach has led to the development of a patented device that enhances measurement accuracy in complex layered structures.

Latest Patents

Jin Ryeong Park holds a patent for a device titled "Focus optimization for wafer which has multi-peak focus." This overlay measurement device includes a light source that directs illumination to an overlay measurement target. The device features a lens assembly with an objective lens and a lens focus actuator, a detector for obtaining focus images, and a controller that manages the lens assembly to acquire depth-specific focus images. The controller extracts multiple candidate focuses from these images and selects the optimal focus by applying predetermined parameters.

Career Highlights

Throughout his career, Jin Ryeong Park has worked with prominent companies in the technology sector. He has been associated with Samsung Electronics Ltd. and Auros Technology, Inc., where he has contributed to various projects that leverage his expertise in optical measurement technologies.

Collaborations

Jin Ryeong Park has collaborated with talented individuals in his field, including Sol Lee Hwang and Jun Yeob Kim. Their combined efforts have further advanced the development of innovative technologies in overlay measurement.

Conclusion

Jin Ryeong Park's contributions to the field of overlay measurement technology exemplify his dedication to innovation. His patented device represents a significant advancement in the accuracy of wafer measurements, showcasing his expertise and commitment to enhancing technological processes.