The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 17, 2026

Filed:

Nov. 03, 2023
Applicant:

Samsung Electronics Co., Ltd., Suwon-si, KR;

Inventors:

Jun Yeob Kim, Suwon-si, KR;

Jin Ryeong Park, Hwaseong-si, KR;

Sol Lee Hwang, Hwaseong-si, KR;

Assignees:

SAMSUNG ELECTRONICS CO., LTD., Suwon-si, KR;

AUROS Technology, Inc, Hwaseong-si, KR;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01B 11/27 (2006.01);
U.S. Cl.
CPC ...
G01B 11/272 (2013.01);
Abstract

An overlay measurement device includes: a light source configured to direct an illumination to an overlay measurement target in which a first overlay key formed in a first layer and a second overlay key formed in a second layer stacked on an upper portion of the first layer are positioned, a lens assembly having an objective lens and a lens focus actuator, a detector configured to obtain a focus image, and a controller configured to control the lens assembly to acquire depth-specific focus images of the overlay measurement target, extract a plurality of candidate focuses from the acquired depth-specific focus images, and select an optimal focus by applying predetermined parameter to the plurality of candidate focuses.


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