Alian, Taiwan

Jin-Lin Liang

USPTO Granted Patents = 3 

Average Co-Inventor Count = 5.5

ph-index = 1


Location History:

  • Alian, TW (2014)
  • Alian Township, TW (2010 - 2016)

Company Filing History:


Years Active: 2010-2016

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3 patents (USPTO):Explore Patents

Title: The Innovative Mind of Jin-Lin Liang

Introduction

Jin-Lin Liang is a prominent inventor located in Alian, Taiwan. His contributions to the field of semiconductor technology have led to the development of three significant patents. With his in-depth knowledge and innovative approach, Liang has made notable advancements in the methods utilized within the semiconductor industry.

Latest Patents

Among his latest patents is a groundbreaking technique for forming a shallow trench isolation (STI) structure. This method involves forming a pad oxide layer over a substrate and a nitride-containing layer with a specific thickness. Liang's approach establishes a correlation between the thickness of the nitride layer and the height of the STI structure, allowing precise calculations and selective removal of the STI for enhanced performance.

Another key patent is related to a silicon wafer reclamation process. This invention introduces an etchant that removes a porous low-k dielectric layer on a semiconductor substrate. The etchant includes a hydrofluoric acid-based solvent along with additives that enhance the effectiveness of the removal process, ensuring a reliable interface between the low-k dielectric layer and the semiconductor substrate.

Career Highlights

Jin-Lin Liang is currently associated with Taiwan Semiconductor Manufacturing Company Ltd. His tenure at this leading semiconductor foundry has been marked by significant contributions to various projects and continuous innovation. With a strong focus on advancing semiconductor technology, Liang has established himself as a key player in the industry.

Collaborations

Liang has collaborated with talented coworkers such as Tai-Yung Yu and Yu-Sheng Su. These collaborations have fostered an environment of creativity and innovation, allowing for the sharing of ideas and expertise that have advanced their collective work in semiconductor research and development.

Conclusion

Jin-Lin Liang's inventive spirit and professional acumen have made him a notable figure in the semiconductor industry. His patents reflect a deep understanding of technology and a commitment to pushing the boundaries of innovation. As he continues to work with his team at Taiwan Semiconductor Manufacturing Company Ltd., it will be exciting to see what future advancements he will bring to light.

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