Fishkill, NY, United States of America

Jin-Jwang Wu

This inventor holds 2 USPTO granted patents. Top assignee: International Business Machines Corporation. Active years: 1999.


% Patents Active = 100.0

Average Co-Inventor Count = 4.0

ph-index = 2

Forward Citations = 136(Granted Patents)


Company Filing History:


Years Active: 1999

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2 patents (USPTO):Explore Patents

Title: The Innovations of Jin-Jwang Wu

Introduction

Jin-Jwang Wu is a notable inventor based in Fishkill, NY (US). He has made significant contributions to the field of semiconductor technology, holding a total of 2 patents. His work focuses on advanced methods for cleaning precision surfaces, which are crucial in the semiconductor manufacturing process.

Latest Patents

Wu's latest patents include innovative methods for the removal of fluorine or chlorine residues from etched precision surfaces. The first patent describes a technique that involves exposing the precision surface to liquid CO.sub.2 under specific conditions to effectively eliminate the residue. Additionally, he has developed a method that utilizes supercritical fluids or liquid CO.sub.2 for residue removal, which can also incorporate cryogenic aerosol for enhanced effectiveness.

Career Highlights

Jin-Jwang Wu is associated with the International Business Machines Corporation, commonly known as IBM. His work at IBM has allowed him to contribute to cutting-edge technologies in the semiconductor industry. His patents reflect his commitment to improving manufacturing processes and enhancing product quality.

Collaborations

Wu has collaborated with esteemed colleagues such as Kenneth John McCullough and Robert J Purtell. These partnerships have fostered a collaborative environment that encourages innovation and the sharing of ideas.

Conclusion

Jin-Jwang Wu's contributions to semiconductor technology through his patents demonstrate his expertise and dedication to innovation. His work continues to influence the industry and pave the way for future advancements.

Profile summary based on public USPTO records.
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