The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 02, 1999
Filed:
Nov. 30, 1998
Applicant:
Inventors:
Kenneth John McCullough, Fishkill, NY (US);
Robert Joseph Purtell, Mohegan Lake, NY (US);
Laura Beth Rothman, South Kent, CT (US);
Jin-Jwang Wu, Fishkill, NY (US);
Assignee:
International Business Machines Corporation, Armonk, NY (US);
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B08B / ;
U.S. Cl.
CPC ...
134-2 ; 134-6 ; 134-7 ; 134 10 ; 134 254 ; 134 36 ; 134902 ; 451 36 ; 451 37 ; 451 38 ; 451 39 ; 451 75 ; 451102 ;
Abstract
A method for the removal of fluorine or chlorine residue from an etched precision surface such as a semiconductor sample is provided which comprises exposing said precision surface to liquid CO.sub.2 under appropriate conditions that are sufficient to remove the residue from the precision surface. Cryogenic aerosol may be used in conjunction with liquid CO.sub.2.