International Business Machines Corporation

Jin-Jwang Wu

Kenneth John McCullough

Robert J Purtell

Laura Beth Rothman

A method for the removal of fluorine or chlorine residue from an etched precision surface such as a semiconductor sample is provided which comprises exposing said precision surface to liquid CO.sub.2 under appropriate conditions that are sufficient to remove the residue from the precision surface. Cryogenic aerosol may be used in conjunction with liquid CO.sub.2.

Removal of fluorine or chlorine residue by liquid CO.sub.2

A method for the removal of residue from an etched precision surface such as a semiconductor sample is provided which comprises exposing said precision surface to a supercritical fluid or liquid CO.sub.2 under appropriate conditions that are sufficient to remove the residue from the precision surface. Cryogenic aerosol may be used in conjunction with either the supercritical fluid or liquid CO.sub.2.

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Fishkill, NY, United States of America

Jin-Jwang Wu