Location History:
- Kyounggi-do, KR (2005)
- Suwon-si, KR (2008 - 2020)
Company Filing History:
Years Active: 2005-2020
Title: The Innovative Contributions of Jin-hyun Shin
Introduction
Jin-hyun Shin is a prominent inventor based in Suwon-si, South Korea. He has made significant contributions to the field of memory devices, holding a total of 9 patents. His work is primarily associated with Samsung Electronics Co., Ltd., where he continues to push the boundaries of technology.
Latest Patents
Among his latest patents is a vertical memory device that features a common source, which includes alternately repeated portions with varying widths. This innovative design incorporates a substrate with multiple channels extending vertically, surrounded by stacked gate lines. The conductive line within this device is periodically altered in width, enhancing its functionality. Another notable patent involves a memory device that consists of an array of floating gate memory cells, which are separated by air gaps. These gaps serve to electrically decouple the active regions of adjacent memory cells, improving performance and reliability.
Career Highlights
Jin-hyun Shin's career at Samsung Electronics Co., Ltd. has been marked by his dedication to advancing memory technology. His innovative designs have not only contributed to the company's success but have also set new standards in the industry. His expertise in vertical memory devices has positioned him as a key figure in the field.
Collaborations
Throughout his career, Jin-hyun has collaborated with talented individuals such as Keon-Soo Kim and Young-Ho Lee. These partnerships have fostered a creative environment that has led to groundbreaking advancements in memory technology.
Conclusion
Jin-hyun Shin's contributions to the field of memory devices are noteworthy and impactful. His innovative patents and collaborations reflect his commitment to advancing technology. As he continues to work at Samsung Electronics Co., Ltd., his influence on the industry is expected to grow even further.