San Ramon, CA, United States of America

Jin Ho Jeon

This inventor holds 3 USPTO granted patents. Top assignee: Applied Materials, Inc.. Active years: 2010-2011.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Jin Ho Jeon. Retrieved from https://idiyas.com/inventor/jin-ho-jeon-0uk0uyna

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

Average Co-Inventor Count = 6.3

ph-index = 3

Forward Citations = 102(Granted Patents)


Company Filing History:


Years Active: 2010-2011

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3 patents (USPTO):Explore Patents

Title: The Innovative Contributions of Jin Ho Jeon

Introduction

Jin Ho Jeon is a notable inventor based in San Ramon, CA (US). He has made significant contributions to the field of semiconductor processing, holding a total of 3 patents. His work focuses on improving etching processes and enhancing the efficiency of semiconductor manufacturing.

Latest Patents

One of Jin Ho Jeon's latest patents is titled "Gapfill improvement with low etch rate dielectric liners." This patent describes a method of filling a trench by depositing a dielectric liner with a high ratio of silicon oxide to dielectric liner etch rate in fluorine-containing etch chemistries. The process involves depositing silicon oxide within the trench and etching it to reopen or widen a gap near the top of the trench. The dielectric liner plays a crucial role in protecting the underlying substrate during the etch process, allowing for a wider gap to be created. Subsequently, silicon oxide is deposited again to substantially fill the trench.

Another significant patent is "Reduction of etch-rate drift in HDP processes." In this patent, a processing chamber is seasoned by providing a flow of season precursors. A high-density plasma is formed from these precursors by applying at least 7500 W of source power, with more than 70% of the power concentrated at the top of the processing chamber. A season layer with a thickness of at least 5000 Å is deposited using this high-density plasma. The process includes sequentially transferring multiple substrates into the processing chamber for etching, with cleaning performed between each transfer.

Career Highlights

Jin Ho Jeon is currently employed at Applied Materials, Inc., a leading company in the semiconductor equipment industry. His work has been instrumental in advancing technologies that enhance manufacturing processes and improve product quality.

Collaborations

Throughout his career, Jin Ho Jeon has collaborated with several talented individuals, including Anchuan Wang and Young Seen Lee. These collaborations have contributed to the development of innovative solutions in semiconductor processing.

Conclusion

Jin Ho Jeon's contributions to the field of semiconductor technology are noteworthy, with his patents reflecting a commitment to innovation and efficiency. His work continues to influence the industry and pave the way for future advancements.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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