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For the Inventor, By the Inventor

Suwon, South Korea

Jin-ho Hwang

This inventor holds 5 USPTO granted patents. Top assignee: Samsung Electronics Co., Ltd.. Active years: 2001-2007.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Jin-ho Hwang. Retrieved from https://idiyas.com/inventor/jin-ho-hwang-a2qi4cnu

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 5

% Patents Active = 20.0

Average Co-Inventor Count = 5.6

ph-index = 2

Forward Citations = 7(Granted Patents)


Location History:

  • Suwon-si, KR (2006)
  • Suwon, KR (2001 - 2007)

Company Filing History:

goldMedal5 out of 132,108 
 
Samsung Electronics Co., Ltd.
 patents

Years Active: 2001-2007

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5 patents (USPTO):Explore Patents
1. 7223721 - Resist and etching by-product removing composition and resist removing method using the same (2007-05-29),
2. 7037852 - Composition for stripping photoresist and method of preparing the same (2006-05-02),
3. 6713440 - Resist and etching by-product removing composition and resist removing method using the same (2004-03-30),
4. 6398874 - Use of alkoxy N-hydroxyalkyl alkanamide as resist removing agent, composition for removing resist, method for preparing the same and resist removing method using the same (2002-06-04),
5. 6274537 - Use of alkoxy N-hydroxyalkyl alkanamide as resist removing agent, composition for removing resist, method for preparing the same and resist removing method using the same (2001-08-14),

Sure, here is the article for you:

Title: Jin-ho Hwang: Pioneering Innovator at Samsung Electronics Co., Ltd.

Introduction:

Jin-ho Hwang, a distinguished inventor hailing from Suwon, South Korea, has made significant strides in the world of innovation. With a portfolio boasting 5 patents, his dedication to excellence and passion for pushing the boundaries of creativity have solidified his position as a standout figure in the industry.

Latest Patents:

Among his latest patents is the groundbreaking invention of a resist removing composition and method for removing etching by-products. This composition demonstrates superior capabilities in removing various materials while ensuring the integrity of underlying layers, setting a new standard in the field of semiconductor manufacturing.

Career Highlights:

Jin-ho Hwang's illustrious career is anchored at Samsung Electronics Co., Ltd., where he continues to drive innovation and technological advancement. His relentless pursuit of excellence has led to the development of cutting-edge solutions that have reshaped the industry's landscape.

Collaborations:

Collaborating with esteemed colleagues such as Dong-jin Park and Sang-mun Chon, Jin-ho Hwang has been able to leverage collective expertise and insights to tackle complex challenges and drive forward-thinking innovations. Together, they form a dynamic team dedicated to pushing the boundaries of what is possible.

Conclusion:

In conclusion, Jin-ho Hwang's unwavering commitment to innovation and his remarkable contributions to the field showcase his status as a visionary inventor. His work not only inspires current generations but also serves as a beacon of inspiration for future innovators looking to make a mark in the world of technology and creativity.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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