The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 30, 2004
Filed:
Jan. 31, 2002
Applicant:
Inventors:
Dong-jin Park, Osan, KR;
Kyung-dae Kim, Suwon, KR;
Sang-mun Chon, Sungnam, KR;
Jin-ho Hwang, Suwon, KR;
Il-hyun Sohn, Yongin, KR;
Sang-oh Park, Sungnam, KR;
Pil-kwon Jun, Seoul, KR;
Assignee:
Samsung Electronics Co., Ltd., Suwon, KR;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C11D 3/44 ;
U.S. Cl.
CPC ...
C11D 3/44 ;
Abstract
A resist removing composition having a superior capability for removing a resist, polymer, organometallic polymer and etching by-products such as metal oxide, which does not attack underlying layers exposed to the composition and which does not leave residues after a rinsing step. The resist removing composition contains alkoxy N-hydroxyalkyl alkanamide and a swelling agent.
Park, Dong-jin. (2004). Resist and etching by-product removing composition and resist removing method using the same (U.S. Patent No. 6713440). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/6713440
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile