Jin-Hao Jhang

Title: Innovations by Jin-Hao Jhang in Semiconductor Technology

Introduction

Jin-Hao Jhang is a notable inventor based in Hsinchu County, Taiwan. He has made significant contributions to the field of semiconductor technology, particularly through his innovative methods for forming semiconductor devices. His work is essential in advancing the efficiency and functionality of electronic components.

Latest Patents

Jin-Hao Jhang holds a patent for a method of forming a semiconductor device. This method includes several operations, such as forming a bottom transistor and a top transistor that overlaps the bottom transistor. A vertical local interconnect (VLI) structure is created to electrically connect the source and drain regions of both transistors. The process also involves forming a hard mask layer over the VLI structure, which consists of a bottom nitride layer, a top nitride layer, and an amorphous semiconductive layer positioned between the two nitride layers. The hard mask layer is then patterned, and a trench is formed in the VLI structure, followed by the creation of an isolation structure within the trench. A first polishing process is performed on the isolation structure and the hard mask layer, stopping at the amorphous semiconductive layer. Finally, a second polishing process is executed on the isolation structure, the bottom nitride layer, and the amorphous semiconductive layer. This innovative approach enhances the performance and reliability of semiconductor devices.

Career Highlights

Jin-Hao Jhang is currently employed at Taiwan Semiconductor Manufacturing Company Limited, a leading firm in the semiconductor industry. His expertise and innovative methods contribute to the company's reputation for excellence in semiconductor manufacturing.

Collaborations

Jin-Hao has collaborated with Shao-Tse Huang, a fellow professional in the semiconductor field. Their partnership exemplifies the collaborative spirit that drives innovation in technology.

Conclusion

Jin-Hao Jhang's contributions to semiconductor technology through his patented methods demonstrate his commitment to innovation and excellence. His work continues to influence the development of advanced electronic devices.