Jin-Hao Jhang

Title: Jin-Hao Jhang: Innovator in Chemical Mechanical Polishing

Introduction

Jin-Hao Jhang is a notable inventor based in Taichung, Taiwan. He has made significant contributions to the field of chemical mechanical polishing, particularly in the development of innovative compositions for polishing tungsten and molybdenum. With a total of 3 patents to his name, Jhang continues to push the boundaries of technology in his area of expertise.

Latest Patents

One of Jin-Hao Jhang's latest patents involves a chemical mechanical polishing composition that includes both anionic and cationic inhibitors. This composition is designed for polishing tungsten or molybdenum and consists of a water-based liquid carrier, abrasive particles, and an amino acid selected from a specific group. The method for chemical mechanical polishing a substrate with a tungsten or molybdenum layer includes contacting the substrate with this polishing composition, moving the composition relative to the substrate, and abrading the substrate to effectively remove a portion of the tungsten or molybdenum layer.

Career Highlights

Jin-Hao Jhang is currently employed at CMC Materials, Inc., where he applies his expertise in chemical mechanical polishing. His work has been instrumental in advancing the technology used in various applications, particularly in the semiconductor industry. His innovative approaches have garnered attention and respect within the field.

Collaborations

Throughout his career, Jin-Hao Jhang has collaborated with talented individuals such as Cheng-Yuan Ko and Hsin-Yen Wu. These collaborations have contributed to the development of cutting-edge technologies and have enhanced the overall impact of their work in the industry.

Conclusion

Jin-Hao Jhang is a prominent figure in the realm of chemical mechanical polishing, with a focus on innovative compositions and methods. His contributions continue to shape the industry, and his collaborations with other experts further amplify his impact.