West Lafayette, IN, United States of America

Jillian Buriak


Average Co-Inventor Count = 2.1

ph-index = 4

Forward Citations = 122(Granted Patents)


Company Filing History:


Years Active: 2001-2009

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7 patents (USPTO):Explore Patents

Title: Jillian Buriak: Innovator in Microelectromechanical Systems

Introduction

Jillian Buriak is a prominent inventor based in West Lafayette, IN (US). She has made significant contributions to the field of microelectromechanical systems, holding a total of 7 patents. Her work focuses on enhancing the performance and durability of micromechanical components.

Latest Patents

One of her latest patents is titled "Surfactant-enhanced protection of micromechanical components from galvanic degradation." This invention involves creating a microelectromechanical structure by depositing sacrificial and structural materials over a substrate. The structural layer has a greater galvanic potential than the component, and a protective material is applied to prevent degradation. Another notable patent is "Functionalized silicon surfaces," which describes a method for producing a silicon substrate with a covalently bound monolayer through an electrochemically-induced reaction. This innovative approach enhances the functionality of silicon surfaces for various applications.

Career Highlights

Jillian has worked with esteemed organizations such as the Purdue Research Foundation and The Scripps Research Institute. Her experience in these institutions has allowed her to advance her research and contribute to the development of cutting-edge technologies.

Collaborations

Throughout her career, Jillian has collaborated with notable colleagues, including Michael P. Stewart and Edward Robins. These partnerships have fostered innovation and have been instrumental in her research endeavors.

Conclusion

Jillian Buriak is a trailblazer in the field of microelectromechanical systems, with a strong portfolio of patents that reflect her innovative spirit. Her contributions continue to shape the future of technology and materials science.

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