Purdue Research Foundation

Altera Corporation

The Scripps Research Institute

Pts Corporation

Jillian Buriak

Michael P Stewart

Edward Robins

Bevan D Staple

Gary E Siuzdak

Jing Wei

A microelectromechanical structure is formed by depositing sacrificial and structural material over a substrate to form a structural layer on a component electrically attached with the substrate. The galvanic potential of the structural layer is greater than the galvanic potential of the component. At least a portion of the structural material is covered with a protective material that has a galvanic potential less than or equal to the galvanic potential of the component. The sacrificial material is removed with a release solution. At least one of the protective material and release solution is surfactanated, the surfactant functionalizing a surface of the component.

Surfactant-enhanced protection of micromechanical components from galvanic degradation

The present invention is directed to a silicon substrate having a monolayer formed by an electrochemically-induced reaction between silicon hydride moieties on the silicon surface and optionally substituted alkynes covalently bound to the surface of the silicon substrate and to a method for electrochemically producing such a functionalized silicon substrate. The method of forming a covalently bound monolayer on a silicon surface comprises the steps of contacting the silicon surface with a C-Calkyne and electrografting optionally substituted alkynes to the silicon surface.

Functionalized silicon surfaces

The present invention is directed to a silicon substrate having a monolayer formed by an electrochemically-induced reaction between silicon hydride moieties on the silicon surface and optionally substituted alkynes covalently bound to the surface of the silicon substrate and to a method for electrochemically producing such a functionalized silicon substrate. The method of forming a covalently bound monolayer on a silicon surface comprises the steps of contacting the silicon surface with a C -C alkyne and electrografting optionally substituted alkynes to the silicon surface.

Methods for forming a covalently bound monolayer on silicon surfaces comprising contacting a silicon substrate with an alkene or alkyne in the presence of a solvent-soluble Lewis acid, and porous silicon substrates having surfaces comprising covalently bound monolayers are provided.

Functionalized porous silicon surfaces

A method for desorption and ionization of an analyte from a porous, light absorbing, semiconductor is disclosed that can be used to replace conventional mass-assisted laser desorption/ionization (MALDI) in the mass spectrometry of proteins and biomolecules. The process uses the semiconductor to trap an analyte on the semiconductor. The semiconductor is illuminated by a light source and absorbs the light energy. The semiconductor then uses the light energy is to desorbed and ionize the analyte. The analyte so desorbed and ionized is suitable for detection by mass analyzers.

Growing community of inventors

West Lafayette, IN, United States of America

Jillian Buriak