Jihoon Cha

Title: Jihoon Cha: Innovator in High-K MIM Capacitors and Substrate Cleaning Technologies

Introduction

Jihoon Cha is a prominent inventor based in Seoul, South Korea. He has made significant contributions to the field of electrical engineering, particularly in the development of advanced capacitor technologies and substrate cleaning methods. With a total of 2 patents, his work has garnered attention for its innovative approaches and practical applications.

Latest Patents

Jihoon Cha's latest patents include a method for manufacturing High-K MIM capacitors aimed at improving electrical characteristics. This invention provides a MIM capacitor utilizing High-k dielectric materials and outlines a method for fabricating it. The process prevents the formation of oxygen-based interface films between the lower electrode and the dielectric layer, as well as between the upper electrode and the dielectric layer. This is achieved by stacking a first film of metal between the High-k dielectric layer and the lower electrode, along with a second film of metal between the dielectric layer and the upper electrode.

Another notable patent is a substrate cleaning apparatus and method. This apparatus features a support inside a chamber to hold a substrate, along with a first supply source that includes a nozzle for spraying polymer and solvent onto the substrate. The design allows for the formation of a coating, while a second nozzle injects hot gas to volatilize the solvent. Additionally, a third nozzle is used for peeling treatment to remove the coating from the substrate, and a fourth supply source injects hot gas to heat the substrate's lower surface.

Career Highlights

Throughout his career, Jihoon Cha has worked with notable companies such as Elohim Incorporation and Samsung Electronics Co., Ltd. His experience in these organizations has contributed to his expertise in developing cutting-edge technologies.

Collaborations

Jihoon Cha has collaborated with talented individuals in his field, including Seunggu Lim and Dong-Ki Lee. These partnerships have fostered innovation and have been instrumental in advancing his research and development efforts.

Conclusion

Jihoon Cha is a distinguished inventor whose work in High-K MIM capacitors and substrate cleaning technologies has made a significant impact in the field of electrical engineering. His innovative patents and collaborations highlight his commitment to advancing technology and improving electrical characteristics in various applications.