The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 16, 2024

Filed:

Jan. 25, 2022
Applicant:

Elohim Incorporation, Daejeon, KR;

Inventors:

Seunggu Lim, Gyeonggi-do, KR;

Jihoon Cha, Seoul, KR;

Dong-Ki Lee, Incheon, KR;

Taedong Kim, Gyeonggi-do, KR;

Yeonglyeol Park, Gyeonggi-do, KR;

Assignee:

Elohim Incorporation, Daejeon, KR;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01G 4/008 (2006.01); H01G 4/12 (2006.01); H01L 49/02 (2006.01);
U.S. Cl.
CPC ...
H01G 4/008 (2013.01); H01G 4/12 (2013.01); H01G 4/1236 (2013.01); H01L 28/75 (2013.01);
Abstract

An embodiment of the present disclosure provides a MIM capacitor by High-k dielectric and method for fabricating the same to prevent formation of oxygen-based interface films between a lower electrode and a dielectric layer, and between an upper electrode and a dielectric layer by stacking a first film formed of metal between the dielectric layer formed of a High-k material having a high dielectric constant and the lower electrode formed of metal, and a second film formed of metal between the dielectric layer and the upper electrode.


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