This inventor holds 1 USPTO granted patent. Top assignee: Advanced Ion Beam Technology, Inc.. Active years: 2005.
Company Filing History:
Years Active: 2005
Title: Innovations of Jihliang Chen in Semiconductor Processing
Introduction: Jihliang Chen, an accomplished inventor based in Saratoga, California, has made significant contributions to the field of semiconductor processing. With an impressive patent under his name, Chen is known for developing technologies aimed at improving the efficiency and effectiveness of wafer processing.
Latest Patents: Chen's notable patent is titled "Semiconductor Processing Chamber Substrate Holder Method and Structure." This invention discusses a method and system for processing wafers that employs a chuck system situated opposite an input source. The innovative aspect of his design includes the application of mechanical and/or electromagnetic forces that deform the substrate. The result is that nearly all parts of the substrate can be oriented at a predetermined angle, such as 90°, with respect to the input source, optimizing the wafer processing procedure.
Career Highlights: Chen has secured one patent throughout his career, reflecting a dedication to advancing semiconductor technologies. He has worked diligently at Advanced Ion Beam Technology, Inc., where his expertise has contributed to various innovative projects.
Collaborations: Within his professional environment, Chen collaborates with talented individuals, including his coworkers Jiong Chen and Jianmin Qiao. Together, they work towards pushing the boundaries of semiconductor technology and enhancing the capabilities of modern processing systems.
Conclusion: Jihliang Chen stands as a prominent figure in the semiconductor processing domain. His innovative approach, exemplified by his patented method and system, highlights his commitment to improving wafer processing techniques. As technology continues to evolve, contributions like those of Chen will undoubtedly pave the way for future advancements in the industry.