This inventor holds 1 USPTO granted patent and 1 published patent application. Top assignee: Shanghai Huali Integrated Circuit Corporation. Active years: 2026.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2026
Title: Jiazhang Xu and His Semiconductor Contact-Filling Patent.
Introduction
Jiazhang Xu is an inventor based in Shanghai, China. His patent work includes a semiconductor fabrication process for forming contacts in integrated circuits. The provided information lists 1 patent and identifies Shanghai Huali Integrated Circuit Corporation as his company.
Latest Patents
Xu’s listed patent is titled “Contact Filling Method.” It describes forming two contacts on different sides of a structure: one side exposes a TiN layer, while the other exposes a Co layer. A selective Co layer is then formed at the bottom of each contact, and both contacts are filled with tungsten. The method outlines a sequence of etching and material-deposition steps for producing the contacts.
Career Highlights
Xu is associated with Shanghai Huali Integrated Circuit Corporation, a company in the semiconductor industry. His listed invention addresses contact formation and filling, processes used in integrated-circuit manufacturing.
Collaborations
The provided information names Zhiqi Yuan as Xu’s coworker. No further details about their collaboration are available.
Conclusion
Jiazhang Xu’s listed patent focuses on a contact-filling method that uses selective cobalt formation and tungsten filling, reflecting his connection to semiconductor manufacturing in Shanghai.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile