Singapore, Singapore

Jiao Song

USPTO Granted Patents = 10 

 

Average Co-Inventor Count = 4.7

ph-index = 5

Forward Citations = 91(Granted Patents)


Company Filing History:


Years Active: 2018-2023

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10 patents (USPTO):

Title: The Innovative Contributions of Jiao Song

Introduction

Jiao Song is a prominent inventor based in Singapore, known for his significant contributions to the field of physical vapor deposition technology. With a total of 10 patents to his name, he has made remarkable advancements that enhance the efficiency and effectiveness of semiconductor manufacturing processes.

Latest Patents

One of Jiao Song's latest patents is titled "Methods and apparatus for extended chamber for through silicon via deposition." This innovative apparatus utilizes a physical vapor deposition (PVD) process chamber with a wafer-to-target distance of approximately 400 millimeters to deposit tantalum film on through silicon via (TSV) structures. The PVD process chamber is equipped with a source that features dual magnet source compensation. Additionally, it includes an upper electromagnet assembly located exterior to the chamber body, in close proximity to the source. The magnetron assembly within the source comprises dual magnets with dual radius trajectories. Furthermore, the chamber contains a shield and a plurality of grounding loops symmetrically spaced around the substrate support assembly, providing an RF ground return path between the substrate support assembly and the shield.

Career Highlights

Jiao Song has established a successful career at Applied Materials, Inc., where he continues to innovate and develop cutting-edge technologies. His work has significantly impacted the semiconductor industry, particularly in enhancing deposition techniques.

Collaborations

Throughout his career, Jiao has collaborated with talented individuals such as Kirankumar Neelasandra Savandaiah and David Gunther, contributing to a dynamic and innovative work environment.

Conclusion

Jiao Song's contributions to the field of physical vapor deposition and his impressive portfolio of patents underscore his role as a leading inventor in the semiconductor industry. His work continues to influence advancements in technology and manufacturing processes.

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