Jiao-Hao Chen

Title: Innovations of Jiao-Hao Chen

Jiao-Hao Chen is a notable inventor based in Hsinchu, Taiwan. He has made significant contributions to the field of semiconductor technology. His work focuses on the development of advanced gate structures for multi-gate devices.

Latest Patents

Jiao-Hao Chen holds a patent for a "Gate structure for multi-gate device and related methods." This patent describes a semiconductor device and related method for forming a gate structure. In some embodiments, the semiconductor device includes a fin extending from a substrate. In certain cases, the fin comprises a plurality of semiconductor channel layers. Additionally, the semiconductor device features a gate dielectric surrounding each of the semiconductor channel layers. Notably, the first thickness of the gate dielectric on the top surface of the topmost semiconductor channel layer is greater than the second thickness on another semiconductor channel layer beneath it. This innovation enhances the performance and efficiency of semiconductor devices.

Career Highlights

Jiao-Hao Chen is associated with Taiwan Semiconductor Manufacturing Company Limited, a leading firm in the semiconductor industry. His work at this company has allowed him to contribute to cutting-edge technologies and advancements in semiconductor manufacturing.

Collaborations

Jiao-Hao Chen has collaborated with several talented individuals in his field, including Kuo-Feng Yu and Chih-Yu Hsu. Their combined expertise has fostered innovation and development in semiconductor technologies.

Conclusion

Jiao-Hao Chen's contributions to semiconductor technology, particularly through his patent on gate structures, highlight his role as an influential inventor in the industry. His work continues to impact the advancement of semiconductor devices.