Jianqiang Lin

Title: Innovations of Jianqiang Lin in Nanowire Transistors

Introduction

Jianqiang Lin is a notable inventor based in Santa Clara, California. He has made significant contributions to the field of nanotechnology, particularly in the development of advanced transistors. His work focuses on enhancing the performance and efficiency of electronic devices.

Latest Patents

Jianqiang Lin holds a patent for a "Localized spacer for nanowire transistors and methods of fabrication." This innovative transistor design features a first channel layer over a second channel layer, with an epitaxial source structure and an epitaxial drain structure. The design includes a gate positioned between these structures, along with a first spacer made of a specific material that has convex sidewalls. Additionally, a second spacer with vertical sidewalls is incorporated above the first channel layer, enhancing the overall functionality of the transistor.

Career Highlights

Jianqiang Lin is currently employed at Intel Corporation, where he continues to push the boundaries of semiconductor technology. His work at Intel has positioned him as a key player in the advancement of nanowire transistors, contributing to the company's reputation for innovation in the tech industry.

Collaborations

Jianqiang Lin collaborates with talented colleagues such as Sudipto Naskar and Willy Rachmady. These partnerships foster a creative environment that encourages the exchange of ideas and the development of groundbreaking technologies.

Conclusion

Jianqiang Lin's contributions to the field of nanowire transistors exemplify the spirit of innovation in technology. His patent and work at Intel Corporation highlight his role as a leading inventor in the semiconductor industry.