Jianpeng Wang

Title: Innovations of Jianpeng Wang in MEMS Technology

Introduction

Jianpeng Wang is a notable inventor based in Shanghai, China. He has made significant contributions to the field of micro-electro-mechanical systems (MEMS). His innovative approaches have led to advancements in the manufacturing processes of MEMS devices.

Latest Patents

Jianpeng Wang holds a patent for "Methods of forming MEMS device." This patent outlines a method that includes providing a substrate, forming a tantalum nitride (TaN) layer on the substrate, and applying a dielectric anti-reflective coating (DARC) layer on the TaN layer. The process also involves coating photoresist on the DARC layer and etching the DARC and TaN layers to create a trench. Additionally, intensified ashing and wet cleaning processes are performed to remove the photoresist and the DARC layer. The DARC layer plays a crucial role in preventing the formation of tantalum-containing polymeric substances during the intensified ashing process.

Career Highlights

Jianpeng Wang is currently employed at Shanghai Huahong Grace Semiconductor Manufacturing Corporation. His work at this esteemed company has allowed him to further his research and development in MEMS technology. His innovative methods have positioned him as a key figure in the semiconductor manufacturing industry.

Collaborations

Jianpeng Wang has collaborated with notable colleagues such as Lei Xiong and Zhenxing Zhang. These collaborations have fostered a productive environment for innovation and have contributed to the advancement of MEMS technologies.

Conclusion

Jianpeng Wang's contributions to MEMS technology through his innovative patent and work at Shanghai Huahong Grace Semiconductor Manufacturing Corporation highlight his importance in the field. His efforts continue to shape the future of semiconductor manufacturing.