Hsinchu, Taiwan

Jiann Sheng Chang

This inventor holds 1 USPTO granted patent. Top assignee: Taiwan Semiconductor Manufacturing Comp. Ltd.. Active years: 2014.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Jiann Sheng Chang. Retrieved from https://idiyas.com/inventor/jiann-sheng-chang

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


Average Co-Inventor Count = 7.0

ph-index = 1


Company Filing History:


Years Active: 2014

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1 patent (USPTO):Explore Patents

Title: Innovator Jiann Sheng Chang: Advancements in Semiconductor Processing

Introduction: Jiann Sheng Chang is a prominent inventor based in Hsin-Chu, Taiwan. His innovative work in the field of semiconductor processing has led to the development of a unique method aimed at reducing substrate warpage, a critical issue in semiconductor fabrication. His contributions have had a significant impact on the efficiency and quality of semiconductor manufacturing.

Latest Patents: Jiann Sheng Chang holds a patent for a system and method designed to reduce substrate warpage during thermal processing. This invention involves pre-heating a substrate in a loadlock chamber prior to the thermal process, and then allowing the substrate to cool down in the same chamber afterward. By implementing this pre-heat and cool-down process, the technology effectively mitigates the warpage caused by the differences in coefficients of thermal expansion (CTEs) of the materials that compose the substrate.

Career Highlights: His extensive experience in the semiconductor industry has positioned him as a valuable asset at Taiwan Semiconductor Manufacturing Company Limited. With a focus on enhancing production methods, Jiann Sheng Chang has established himself as an influential figure in the research and development department, contributing to the advancement of cutting-edge semiconductor technologies.

Collaborations: Throughout his career, Jiann Sheng Chang has collaborated with fellow innovators and professionals in the field, including notable coworkers such as Chen-Hua Douglas Yu and Wen-Chih Chiou. These partnerships have fostered a collaborative environment conducive to innovation and the pursuit of groundbreaking solutions in semiconductor processing.

Conclusion: Jiann Sheng Chang's commitment to improving substrate processing in semiconductors exemplifies the spirit of innovation within the technology sector. His patent represents a significant step forward, enhancing the reliability and performance of semiconductor devices. As the industry continues to evolve, inventors like Chang will play a crucial role in shaping the future of semiconductor technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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