Jianfeng Xu

Title: The Innovative Contributions of Jianfeng Xu

Introduction

Jianfeng Xu is a notable inventor based in Singapore, recognized for his contributions to substrate processing technology. With a focus on enhancing the efficiency and effectiveness of substrate processing methods, Xu has made significant strides in the field.

Latest Patents

Jianfeng Xu holds a patent for a substrate processing method and apparatus. This innovative method involves a chamber that includes a substrate support, an upper electrode, and a gas supply port. The process consists of several steps: providing the substrate on the substrate support, supplying a first processing gas into the chamber, and generating plasma from the first processing gas using a continuous RF signal and a negative DC voltage. The method also includes the alternating supply of a pulsed RF signal, with a specific time constraint for each step, ensuring efficiency in substrate processing.

Career Highlights

Xu is currently employed at Tokyo Electron Limited, a leading company in the semiconductor manufacturing equipment industry. His work at Tokyo Electron Limited has allowed him to apply his innovative ideas in a practical setting, contributing to advancements in substrate processing technologies.

Collaborations

Throughout his career, Jianfeng Xu has collaborated with esteemed colleagues such as Seiichi Watanabe and Kazuki Narishige. These collaborations have fostered a creative environment that encourages the exchange of ideas and the development of cutting-edge technologies.

Conclusion

Jianfeng Xu's contributions to substrate processing methods exemplify the impact of innovation in technology. His patent and work at Tokyo Electron Limited highlight his commitment to advancing the field, making him a significant figure in the realm of substrate processing.