Jian Nian Chen

Title: Innovations by Jian Nian Chen

Introduction

Jian Nian Chen is a notable inventor based in Kaohsiung, Taiwan. He has made significant contributions to the field of semiconductor technology. His innovative approach has led to the development of a unique semiconductor device that enhances performance and reliability.

Latest Patents

Jian Nian Chen holds a patent for a "Semiconductor device with stress relief feature and method therefor." This patent describes a method of manufacturing a semiconductor device that includes placing a package substrate on a carrier substrate, forming a frame on the package substrate, and affixing an active side of a semiconductor die on the package substrate. The design creates a cavity between the semiconductor die and the package substrate, ensuring that at least a portion of both components is encapsulated with an encapsulant. The frame is specifically configured to prevent the encapsulant from entering the cavity, thereby enhancing the device's functionality.

Career Highlights

Jian Nian Chen is currently employed at NXP B.V., a leading company in the semiconductor industry. His work focuses on advancing semiconductor technologies and improving device performance. His innovative contributions have positioned him as a key player in his field.

Collaborations

Some of Jian Nian Chen's coworkers include Tzu Ya Fang and Yen-Chih Lin. Their collaborative efforts contribute to the ongoing advancements in semiconductor technology.

Conclusion

Jian Nian Chen's work in semiconductor innovation exemplifies the impact of dedicated inventors in technology. His patent and contributions to NXP B.V. highlight the importance of innovation in enhancing device performance and reliability.