San Jose, CA, United States of America

Jian Ma

This inventor holds 2 USPTO granted patents and 1 published patent application. Top assignee: Intel Corporation. Active years: 2008-2014.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Jian Ma. Retrieved from https://idiyas.com/inventor/jian-ma-gj39qudd

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 2 

Average Co-Inventor Count = 6.0

ph-index = 1


Company Filing History:


Years Active: 2008-2014

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2 patents (USPTO):Explore Patents

Jian Ma: Innovator in Advanced Mask Patterning Technologies

Introduction

Jian Ma is a prominent inventor based in San Jose, California, recognized for his contributions to the field of advanced mask patterning technologies. With a total of two patents to his name, Jian has showcased his expertise in creating innovative solutions that enhance imaging structures used in semiconductor manufacturing.

Latest Patents

Jian's latest patents focus on advanced mask patterning with a unique approach involving a patterning layer on an imaging layer. The key aspects of his invention include:

- An imaging structure, such as a mask or reticle, is fabricated using a patterning layer that possesses significantly different etch properties compared to the imaging layer.

- A first etch process selectively targets the patterning layer in relation to a resist layer.

- A second etch process is designed to be selective of the imaging layer concerning the patterning layer.

This innovative technique promises to enhance the precision and efficiency in the fabrication of semiconductor devices.

Career Highlights

Jian Ma is associated with Intel Corporation, a leader in semiconductor manufacturing and technology innovation. His work contributes significantly to Intel's ongoing research and development efforts, ensuring the company remains at the forefront of the industry. With a blend of technical skill and creative problem-solving, Jian has made impactful strides in his career.

Collaborations

Throughout his tenure at Intel, Jian has collaborated with esteemed colleagues such as Phil Freiberger and Karmen Yung. These partnerships foster an environment of innovation and knowledge-sharing, propelling advancements in their respective fields and enhancing the overall quality of their work.

Conclusion

Jian Ma stands out as a notable inventor in the semiconductor industry, with his advanced mask patterning technologies paving the way for next-generation imaging structures. As his patents evolve, the impact of his innovations will undoubtedly resonate throughout the technological landscape.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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