Hsinchu, Taiwan

Jia-Shing Jan


Average Co-Inventor Count = 2.4

ph-index = 1


Location History:

  • Taipei, TW (2004)
  • Hsinchu, TW (2005)

Company Filing History:


Years Active: 2004-2005

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2 patents (USPTO):Explore Patents

Title: Innovations by Inventor Jia-Shing Jan

Introduction

Jia-Shing Jan is a notable inventor based in Hsinchu, Taiwan. He has made significant contributions to the field of technology, particularly in methods related to chemical processes and semiconductor manufacturing. With a total of 2 patents, his work reflects a commitment to advancing industrial practices.

Latest Patents

Jia-Shing Jan's latest patents include a "Method of Spiking Mixed Acid Liquid in Reactor" and a "Method for Removing Si-Needles of Wafer." The first patent describes a method for controlling the concentration of a mixed acid liquid in a reactor through three modes of control: based-on-charge, based-on-time, and based-on-time-and-charge. This innovative approach allows for precise management of acid liquid spiking, ensuring optimal conditions for each product lot. The second patent focuses on a method for removing deep trench Si-needles from a wafer. This process involves forming a photoresist layer, etching, and ultimately removing the photoresist, which enhances the quality of semiconductor wafers.

Career Highlights

Jia-Shing Jan is currently employed at Winbond Electronics Corporation, a leading company in the semiconductor industry. His work at Winbond has allowed him to apply his innovative ideas in a practical setting, contributing to the company's advancements in technology.

Collaborations

Some of his notable coworkers include Chih-Jung Ni and Yueh-Liang Liu. Their collaboration has likely fostered an environment of innovation and creativity within their projects.

Conclusion

Jia-Shing Jan's contributions to the field of technology through his patents and work at Winbond Electronics Corporation highlight his role as a significant inventor. His innovative methods are paving the way for advancements in chemical processes and semiconductor manufacturing.

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