Seoul, South Korea

Ji Hoon Cha

USPTO Granted Patents = 9 

Average Co-Inventor Count = 7.3

ph-index = 1

Forward Citations = 1(Granted Patents)


Location History:

  • Suwon-si, KR (2023)
  • Seoul, KR (2021 - 2024)

Company Filing History:


Years Active: 2021-2025

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9 patents (USPTO):

Title: Innovator Profile: Ji Hoon Cha, A Visionary in Wafer Technology

Introduction

Ji Hoon Cha, an accomplished inventor based in Seoul, South Korea, holds an impressive portfolio with seven patents to his name. His work, predominantly in the semiconductor industry, has made significant contributions to the advancement of wafer processing technologies. As an engineer at Samsung Electronics Co., Ltd., Cha continues to push the boundaries of innovation.

Latest Patents

Among his latest creations, Cha has developed a Wet Etching Apparatus. This innovative apparatus features a process bath designed to accommodate etchants, along with a support unit that securely holds the wafer in contact with the etchant. Additionally, it incorporates a laser unit positioned above the bath, which directs a laser beam to the wafer to enhance its heating process. His second noteworthy invention is the Wafer Cleaning Apparatus and Wafer Cleaning Method. This cutting-edge system consists of a chamber for wafer loading, a nozzle that applies liquid chemicals directly onto the wafer's surface, and a powerful laser module for precise irradiation. The apparatus is designed to optimize the temperature of the wafer while efficiently cleaning it.

Career Highlights

Ji Hoon Cha has established a reputation within the industry through his groundbreaking inventions and contributions to wafer technology. As a vital member of Samsung Electronics Co., Ltd., he has played a crucial role in enhancing the efficacy of wafer cleaning and processing techniques. His patents reflect a deep understanding of the complexities involved in semiconductor manufacturing.

Collaborations

Cha's success is further supported by his collaborations with esteemed colleagues, including Seung Min Shin and Seok Hoon Kim. Together, they have worked on various projects, utilizing their collective expertise to drive innovation and seek solutions that address the challenges within the semiconductor sector.

Conclusion

With a proven track record of innovation and collaboration, Ji Hoon Cha continues to be a leading figure in the field of wafer technology. His patents not only showcase his creativity and technical skill but also contribute to the evolution of semiconductor manufacturing processes. As the industry progresses, Cha's work will undoubtedly remain influential in shaping the future of technology.

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