Company Filing History:
Years Active: 2014-2017
Title: The Innovations of Ji-Gang Pan
Introduction
Ji-Gang Pan is a notable inventor based in Beijing, China. He has made significant contributions to the field of semiconductor technology. With a total of two patents to his name, his work focuses on advanced manufacturing methods that enhance semiconductor structures.
Latest Patents
Ji-Gang Pan's latest patents include a manufacturing method of a semiconductor structure that involves planarizing a polysilicon layer over an array area and a periphery area. This method outlines a series of steps, starting with the provision of a substrate and the formation of trenches filled with insulating material. The process continues with the deposition of a polysilicon layer and the etching of a portion of this layer to achieve a specific height differential. A planarization process is then implemented to refine the polysilicon layer on both the array and periphery areas. Another significant patent is a polishing method of a semiconductor device, which details a main polishing step followed by an auxiliary polishing step, emphasizing the different selectivities of silicon to oxide during the process.
Career Highlights
Ji-Gang Pan is currently employed at United Microelectronics Corporation, where he applies his expertise in semiconductor manufacturing. His innovative approaches have contributed to advancements in the industry, particularly in the efficiency and effectiveness of semiconductor devices.
Collaborations
Throughout his career, Ji-Gang Pan has collaborated with esteemed colleagues such as Han-Chuan Fang and Boon-Tiong Neo. These partnerships have fostered a collaborative environment that encourages innovation and the sharing of ideas.
Conclusion
Ji-Gang Pan's contributions to semiconductor technology through his patents and collaborations highlight his role as a key innovator in the field. His work continues to influence advancements in semiconductor manufacturing processes.