Seoul, South Korea

JeongHo Yeon


Average Co-Inventor Count = 9.0

ph-index = 1

Forward Citations = 1(Granted Patents)


Company Filing History:


Years Active: 2015

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1 patent (USPTO):Explore Patents

Title: JeongHo Yeon: Innovating Nanoscale Patterns for the Future

Introduction:

In the world of innovative technologies, one name stands out - JeongHo Yeon. Hailing from Seoul, Korea, Yeon has made a significant impact in the field of nanoscale pattern fabrication. With his expertise and inventive thinking, he has propelled LG Innotek Co., Ltd. to new heights in the realm of technological advancements.

Latest Patents:

Yeon's remarkable career is highlighted by his patent titled "Method for fabricating large-area nanoscale pattern." This groundbreaking method involves the formation of multilayer main thin films separated by passivation layers. By employing spacer lithography techniques, Yeon has successfully achieved the repetitive reduction of pattern pitch, enabling the production of nanometer-scale fine patterns uniformly over a wide area. This patent truly demonstrates his ingenuity and dedication to advancing nanoscale technology.

Career Highlights:

Yeon has been a vital member of LG Innotek Co., Ltd., an internationally renowned company specializing in the development and manufacture of cutting-edge electronic components. Through his relentless pursuit of innovation, Yeon has revolutionized the field of nanoscale pattern fabrication. His contributions have not only enhanced LG Innotek's reputation but have also placed them at the forefront of technological advancements.

Collaborations:

Collaboration is often the key to groundbreaking inventions, and Yeon has embraced this philosophy. His work has seen successful collaborations with esteemed colleagues such as Young-Jae Lee and Kyoung Jong Yoo. Together, they have pushed the boundaries of nanoscale pattern fabrication, working tirelessly towards achieving remarkable results. These collaborations highlight Yeon's ability to foster a cooperative and innovative environment where immense ideas can flourish.

Conclusion:

JeongHo Yeon's relentless dedication and inventive prowess have firmly established him as a leading figure in the world of nanoscale pattern fabrication. His patent and career highlights signify his remarkable contributions to the field. As we look ahead into the future, Yeon undoubtedly will continue to drive innovation and shape the landscape of nanoscale technology. We eagerly anticipate his future endeavors and eagerly await the next groundbreaking patent to emerge from his ingenious mind.

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